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Dr. Vijay Shinde

Assistant Professor
Department of Chemical Engineering & Technology
Phone No(s): (+91) 0542716505
Email: vijay.che@iitbhu.ac.in
Area of Interest: Heterogeneous Catalysis, Reaction Kinetics and Modeling, Computational Fluid Dynamics (CFD), Chemical Vapor Deposition (CVD), Computational Materials Processing
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Education

2008: B.Tech Chemical Engineering, Dr. B A Tech University, Lonere
2010: M.Tech Chemical Engineering, Indian Institute of Technology, Kharagpur 
2013: Ph.D Chemical Engineering, Indian Institute of Science, Bangalore

Experience

2016: Post-Doctoral Research Associate, Department of Chemical Engineering (Delft University of Technology, Netherlands)
2017: Assistant Professor, Department of Chemical Engineering  (IIT BHU)

  1. Yogesh S. Bijjargi, Vijay Shinde, Abhisek Mudgal, Harish Kumar and N. Eswara Prasad, CFD modelling and optimal design of SiC deposition on the fuel combustion nozzle in a commercial CVD reactor, Ceramics International 48 (2022) 11043-11055.
  2. Anand Gupta, Shikhar Nigam and Vijay Shinde, Gas-phase kinetic of boron carbide chemical vapour deposition using BCl3+CH4+H2 mixture, Journal of the American Ceramic Society 105 (2022) 3885-3895.
  3. Anand Gupta, Abhisek Mudgal, Vijay Shinde, Harish Kumar and N Eswara Prasad, Optimal design of CH4 pyrolysis in a commercial CVD reactor using support vector machines and Nelder-Mead algorithm, Chemical Engineering Research and Design 178 (2022) 124-135.
  4. Vijay Shinde, Balamurugan Deivendran, Harish Kumar and N. Eswara Prasad, Investigation of transport processes in a commercial hot-wall CVD reactor with multi-substrates for high-quality pyrocarbon deposition, Surface and Coatings Technology 425 (2021) 127685.
  5. Vijay Shinde and Prashun Pradeep, Detailed gas-phase kinetics and reduced reaction mechanism for methane pyrolysis involved in CVD/CVI processes, Journal of Analytical and Applied Pyrolysis 154 (2021) 104998.
  6. Balamurugan Deivendran, Vijay Shinde, Harish Kumar and N Eswara Prasad, 3D Modeling and optimisation of SiC deposition from CH3SiCl3/H2 in a commercial hot-wall reactor, Journal of Crystal Growth 554 (2021) 125944.

1. CHO102 Fluid Mechanics
2. CHE405 Modeling Simulation and Optimization
3. CHE504 Chemical Reactor Analysis and Design