ravi.che's picture
Dr. Ravi P. Jaiswal
Assistant Professor
Department of Chemical Engineering & Technology
Area of Interest: 
Solar Energy, Wastewater Treatment, Interfacial Adhesion, Smart Surfaces

  • PhD in Chemical Engineering , Purdue University, USA (Dec-2008)
  • B-Tech in Chemical Engineering , IIT Kanpur, India (Jun-2004)

1. Assistant Professor, Indian Institute of Technology (BHU), Varanasi, India, [Oct 2015 – Present]
2. Research Scientist, MEMC Electronic Materials Inc.(aka SunEdison), St. Peter, MO, USA, [Feb 2011 - Jun 2014]
3. Process Technology Development Engineer, Intel Corp. Hillsboro, OR, USA, [Feb 2009- Feb 2011]

1. BIC (Best-in-Class) Recognition, Intel Corp., Hillsboro, OR, USA (2010): Achieving the targeted throughput and yield during the technology transfer in Wet-Etch module for the i-Core products (i3/i5/i7)

2. Leighton H. Peebles Award, The Adhesion Society, Savanna, GA, USA (2009): Outstanding graduate (PhD) research in Adhesion Science

3. General Proficiency Medal, IIT Kanpur, India (2004): Best outgoing student in B-Tech, CHE

4. Ajai Agarawal Memorial Best Student Award, IIT- Kanpur, India (2004): Best academic performance in 2 consecutive years (Sophomore-Junior)

Courses offered

  • Fluid Mechanics
  • Heat and Mass Transfer

Solar Energy
We are interested to explore and augment the current understanding of the photovoltaic devices, such as Silicon solar cell and Dye-Sensitized solar cell, with the final goal of increasing their overall efficiencies. A photovoltaic device is basically a multi-layered structure comprised of the p-n junction, transparent electrodes, metallic contacts, anti-reflection coating, and packaging materials. The competency of a solar technology is evaluated on the basis of the operating efficiency per unit currency spent, hence there is always a push to lower the cost and enhance the efficiency to make the solar technology more economically competitive. We are interested to reduce the optical, electrical and thermal losses incurred in the modern photovoltaic devices. Specifically, we are looking into ways to effectively utilize the incident sun light, prevent recombination pathways, and manage heat budget for a higher overall efficiency of the solar devices.
Wastewater Treatment
We are interested to degrade organic contaminants present in the wastewater effluents of various industries. We are particularly working on physical, chemical and biological routes or a hybrid process for capturing and detoxifying contaminants present in the wastewater. Our final goal is to develop an economical and efficient process for wastewater treatment at large scale.

We are interested in understanding and engineering the adhesion characteristics at the solid-solid and solid-fluid interfaces by modifying the physical and chemical properties of the interacting surfaces. The relevant applications may include, but not limited to, Easy-to-clean surfaces, Biofouling-resistant surfaces, Asphalt adhesion, etcetera. In particular, we are studying the roles of surface morphologies and surface chemistries in altering the interfacial forces (or surface free energy) to lead a desired adhesive response.

Journal (h-index: 6, Source: Google Scholar)
1.      Jaiswal, R., and Beaudoin, S., “Approximate Scheme for Calculating van der Waals Interactions between Finite Cylindrical Volume Elements”, Langmuir, vol.28(22), 8359–8370, (2012).
2.      Kilroy, C., Jaiswal, R., and Beaudoin, S., “Adhesion of Contaminant Particles to Advanced Photomask Materials”, IEEE Transactions on Semiconductor Manufacturing, vol. 25 (1), 37-44 (2012).
3.      Jaiswal, R., and Beaudoin, S., “Nanoparticle Adhesion Models: Applications in Particulate Contaminant Removal from Extreme Ultraviolet Lithography Photomasks”, Journal of Adhesion Science and Technology, vol. 25 (8), 781-797 (2011).
4.      Jaiswal, R., Kumar, G., Kilroy, C., and Beaudoin, S., “Modeling and Validation of the van der Waals Force During the Adhesion of Nanoscale Objects to Rough Surfaces”, Langmuir, vol.25(18), 10612–10623, (2009).
5.      Kumar, G., Smith, S., Jaiswal, R., and Beaudoin, S., “Scaling of van der Waals and Electrostatic Adhesion Interactions from the Micro- to the Nano-Scale”, Journal of Adhesion Science and Technology, vol.22, 407-428, (2008).
6.      Beaudoin, S., Graham, S., Jaiswal, R., Kilroy, C., Kim, B.-S., Kumar, G., and Smith, S.,“An Update on Low-k Dielectrics”, Invited Article, The Electrochemical Society: Interface, vol.14(2), 35 (2005).
Text Book
1. ‘Particle Adhesion and Removal’ Edited by Dr. K. L. Mittal and Dr. R. P. Jaiswal, John Wiley and Scrivener Publishing, USA (2015).

Book Chapter
1.      Jaiswal, R., Kilroy, C., Kumar,G., Banerjee, S., and Beaudoin, S., ‘Chapter-14: Particle Adhesion to Photomask Substrate’,  Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing, v-11, no.2, pg.465-470 (2007)

1.      Jaiswal, R., and Beaudoin, S., “Adhesion of Particles and Nano-structured Substrates”, Invited talk, The Fourth International Conference on Nanostructured Materials and Nanocomposites, Mahatma Gandhi University, Kottayam, Kerala, India (Feb 10-12, 2017)

2.      Smith, K., Jaiswal, R., and Beaudoin, S., “Effects of Varying Surface Film Thickness on Particle Adhesion”, Annual Meeting of the American Institute of Chemical Engineering, Particle Technology Forum, Salt Lake City, UT, USA (Nov-9, 2010)

3.      Jaiswal, R., and Beaudoin, S., “Fundamental Study of Surface Forces in Particle Adhesion to Thin Films”, Invited talk, The 32nd Annual Meeting of the Adhesion Society, Savannah, GA, USA (Feb 15-19, 2009)

4.      Beaudoin, S., Jaiswal, R., Kilroy, C., Balachandran, D., and Lee, K., “Pharmaceutical Particle Adhesion to Surfaces”, The 2008 Regional Meeting of American Institute of Chemical Engineering, Pharmaceuticals - New Ideas and Concepts, Chicago, IL, USA (Sep-23, 2008)

5.      Jaiswal, R., and Beaudoin, S., “Modeling and experimental validation of surface/interfacial forces between particles and thin films”, Graduate Research Symposium, Purdue University, W. Lafayette, IN, USA (Aug-2008)        

6.       Jaiswal, R., Kilroy, C., and Beaudoin, S., “Adhesion between Particles and Nano-Structured Films”, Invited talk, The5th International Surface Cleaning Workshop, Boston, MA, USA (Nov 13-14, 2007)

7.      Kilroy, C., Kumar, G., Jaiswal, R., and Beaudoin, S., “Particle Adhesion to Photomask Materials”, Annual Meeting of the American Institute of Chemical Engineering, Materials Engineering and Sciences Division, Salt Lake City, UT, USA (Nov-8, 2007)

8.      Jaiswal, R. and Beaudoin, S., “van der Waals Forces Between Micron-/nano-Scale Contaminants and Patterned Substrates”, Annual Meeting of the American Institute of Chemical Engineering, Particle Technology Forum,  Salt Lake City, UT, USA (Nov-5, 2007)

9.      Liang, T, Guojing Z., Henry Y., Jaiswal, R., “Status and Challenges in EUV Mask Cleaning” Extreme UV-Lithography Symposium, Sapporo, Japan (Oct 29-31, 2007)

10.  Jaiswal, R., Kilroy, C., Kumar, G., Banerjee, S., and Beaudoin, S., “Particle Adhesion to Photomask Surfaces”, The 212th Electrochemical Society Meeting, Washington, DC, USA (Oct 7-12, 2007)

11.  Beaudoin, S., Kumar, G., Jaiswal, R., Smith, S., “Adhesion of Nano-Scale Particles to Photomasks”, The 210th  Electrochemical Society Meeting, Nanotechnology General Session, Cancun, Mexico, (Oct 29 – Nov 3, 2006)

12.  Jaiswal, R., “Boundary Layer in Fluid Mechanics”, Seminar talk in “Winter Academy” held by DAAD, Germany at IIT Kanpur, India (2002)